Method and structure for charge dissipation during fabrication of integrated circuits and isolation thereof

ABSTRACT

A method, structure and design method for dissipating charge during fabrication of an integrated circuit. The structure includes: a substrate contact in a substrate; one or more wiring levels over the substrate; one or more electrically conductive charge dissipation structures extending from a top surface of an uppermost wiring level of the one or more wiring levels through each lower wiring level of the one or more wiring levels to and in electrical contact with the substrate contact; and circuit structures in the substrate and in the one or more wiring layers, the charge dissipation structures not electrically contacting any the circuit structures in any of the one or more wiring levels, the one or more charge dissipation structures dispersed between the circuit structures.

FIELD OF THE INVENTION

The present invention relates to the field of integrated circuits; morespecifically, it relates to method and structure for charge dissipationduring fabrication of integrated circuits and isolation of circuits andstructures in completed integrated circuits.

BACKGROUND OF THE INVENTION

Integrated circuits are liable to damage from electrostatic potentialvariations, electromagnetic interference (EMI), electrical overstress(EOS), and electrostatic discharge (ESD) during fabrication as well asduring normal operation. During fabrication, one source of ESD is chargeinduced by the various plasma etch and plasma deposition processes.During fabrication, plasma processes can have non-uniform electricalfields and magnetic fields in a semiconductor tooling. Non-uniformitiesin the electrical field, and the plasma environments can lead tonon-uniform charge deposition in a semiconductor wafer. Additionally,these voltage gradients can lead to plasma arcing. Voltage gradientsthat are established across a semiconductor wafer can lead to chargere-distribution and damage to components on the wafer. After fabricationthere are many potential sources of ESD, for example handling of theintegrated circuit chips. A related type of ESD-like damage can occurbetween various sub-circuits and structures operating at differentvoltage levels during normal operation of the integrated circuit.Similarly electromagnetic induced (EMI) cross-talk between variouscircuits and structures during normal operations can cause damage to aswell as failures of the integrated circuit.

Therefore, there is a need for a method and structure for chargedissipation during fabrication of integrated circuits and isolation ofcircuits and structures in completed integrated circuits.

SUMMARY OF THE INVENTION

A first aspect of the present invention is an integrated circuit chip,comprising: a substrate contact in a substrate; one or more wiringlevels over the substrate; one or more electrically conductive chargedissipation structures extending from a top surface of an uppermostwiring level of the one or more wiring levels through each lower wiringlevel of the one or more wiring levels to and in electrical contact withthe substrate contact; and circuit structures in the substrate and inthe one or more wiring layers, the charge dissipation structures notelectrically contacting any circuit structures in any of the one or morewiring levels, the one or more charge dissipation structures dispersedbetween the circuit structures.

A second aspect of the present invention is a method of fabricating anintegrated circuit chip, comprising: forming a substrate contact in asubstrate; forming one or more wiring levels over the substrate; formingone or more electrically conductive charge dissipation structuresextending from a top surface of an uppermost wiring level of the one ormore wiring levels through each lower wiring level of the one or morewiring levels to and in electrical contact with the substrate contact;and forming circuit structures in the substrate and in the one or morewiring levels, the charge dissipation structures not electricallycontacting any the circuit structures in any of the one or more wiringlevels, the one or more charge dissipation structures dispersed betweenthe circuit structures.

A third aspect of the present invention is a method, comprising: placingintegrated circuit element shapes comprising substrate contact, contact,single-damascene wire, dual-damascene wire or via shapes in a hierarchalset of design levels from a lowest to a highest design level of anintegrated circuit chip; and placing charge dissipation structure shapescomprising additional substrate contact, additional contact, additionalwire or additional via shapes in each design level of the hierarchal setof design levels, within each design level the charge dissipationstructure shapes not contacting the integrated circuit element shapes,the charge dissipation shapes in each design level electricallyconnected to one another and not electrically connected to any contact,via or single-damascene wire shape of the integrated circuit elementshapes in immediately lower design levels of the hierarchal set ofdesign levels.

BRIEF DESCRIPTION OF DRAWINGS

The features of the invention are set forth in the appended claims. Theinvention itself, however, will be best understood by reference to thefollowing detailed description of an illustrative embodiment when readin conjunction with the accompanying drawings, wherein:

FIG. 1 is a top view of an integrated circuit chip prior to formation ofterminals according a first embodiment of the present invention;

FIG. 2 is a cross-sectional view through line 2-2 of FIG. 1;

FIG. 3 is a cross-sectional view through an integrated circuit prior toformation of terminals according a variation of the first embodiment ofthe present invention;

FIG. 4 is a top view of an integrated circuit chip prior to formation ofterminals according a second embodiment of the present invention;

FIG. 5 is a cross-sectional view through line 5-5 of FIG. 4;

FIG. 6 is a top view of an integrated circuit chip prior to formation ofterminals according a third embodiment of the present invention;

FIG. 7 is a top view of an integrated circuit chip prior to formation ofterminals according fourth embodiment of the present invention;

FIG. 8 is a top view illustrating incorporation of dummy fill shapesinto the embodiments of the present invention;

FIG. 9 is a flowchart of a first method of designing an integratedcircuit chip according to the embodiments of the present invention;.

FIG. 10 is a flowchart of a second method of designing an integratedcircuit chip according to the embodiments of the present invention.

DETAILED DESCRIPTION OF THE INVENTION

A damascene process is one in which wire trenches or via openings areformed in a dielectric layer, an electrical conductor of sufficientthickness to fill the trenches is deposited on a top surface of thedielectric, and a chemical-mechanical-polish (CMP) process performed toremove excess conductor and make the surface of the conductor co-planerwith the surface of the dielectric layer to form damascene wires (ordamascene vias). When only a trench and wire (or via opening and via) isformed the process is called single-damascene.

A dual-damascene process is one in which via openings are formed throughthe entire thickness of a dielectric layer followed by formation oftrenches part of the way through the dielectric layer in any givencross-sectional view. All via openings are intersected by integral wiretrenches above and by a wire trench below, but not all trenches needintersect a via opening. An electrical conductor of sufficient thicknessto fill the trenches and via opening is deposited on a top surface ofthe dielectric and a CMP process performed to make the surface of theconductor in the trench co-planer with the surface the dielectric layerto form dual-damascene wires and dual-damascene wires having integraldual-damascene vias.

Fill shapes are single-damascene or dual-damascene structures madeconcurrently with single-damascene or dual-damascene wires and vias in awiring level, but are not electrically connected to any wire or viacontained in the same wiring level as the fill shape or normally to anywire, via or fill shape in other wiring levels.

FIG. 1 is a top view of an integrated circuit chip prior to formation ofterminals according a first embodiment of the present invention. In FIG.1, an integrated circuit chip 100 includes an electrically conductiveguard ring 105 located adjacent to but not abutting the periphery ofintegrated chip 100 and a multiplicity of electrically conductive chargedissipation structures 110 distributed throughout integrated circuitchip 100 within guard ring 105. Charge dissipation structures 110 areplaced in a distributed fashion to reduce the voltage differentialbetween any two points across integrated circuit chip 100.

The placement of the charge dissipation structures 110 is to avoidelectrical potential variations that can occur due to plasmanon-uniformities, and reduce the likelihood of plasma arcing withinintegrated circuit chip 110. While charge dissipation structures 110 areillustrated as uniformly and symmetrically distributed within guard ring105, charge dissipation structures 110 may be located randomly withinguard ring 105.

Guard ring 105 forms a continuous vertical structure along the peripheryof integrated circuit chip within each wiring level (as described infra)and extends from a top surface 115 of integrated circuit chip 100 to thesubstrate on which integrated circuit chip 100 is fabricated. Eachcharge dissipation structure forms a continuous vertical structurethrough each wiring level (as described infra) and extends from topsurface of integrated circuit chip 100 to the substrate on whichintegrated circuit chip 100 is fabricated at each wiring level ofintegrated circuit chip 100.

FIG. 2 is a cross-sectional view through line 2-2 of FIG. 1. In FIG. 2,integrated circuit chip 100 comprises a substrate 125, a buried oxide(BOX) level 130 formed on the substrate, a contact level 135 formed onthe BOX level, a first wiring level 140, formed on the contact level, asecond wiring level 145 formed on the first wiring level, a third wiringlevel 150 formed on the second wiring level, a fourth wiring level 155formed on the third wiring level and a fifth wiring level 160 formed onthe fourth wiring level. There may be more or less wiring levels thanthe five wiring levels illustrated in FIG. 2. In the example of FIG. 2,contact layer 135 and first wiring level 140 are formed by damasceneprocesses, while second, third, fourth and fifth wiring levels 145, 150,155 and 160 are formed by dual-damascene processes. Contact layer 135and first, second, third, fourth and fifth wiring levels 140, 145, 150,155 and 160 may be formed by any method known in the art.

During fabrication of SOI wafers, plasma processes can have non-uniformelectrical fields and magnetic fields in a semiconductor tooling.Non-uniformities in the electrical field, and the plasma environmentscan lead to non-uniform charge deposition in a semiconductor wafer.Additionally, these voltage gradients can lead to plasma arcing. Voltagegradients that are established across a semiconductor wafer can lead tocharge re-distribution and damage to components on the wafer. Byplacement of charge dissipation structures, the voltage gradients can bereduced and the charge dissipated.

In one example, substrate 125 is single crystal silicon. BOX layer 130includes a buried oxide layer surrounding single crystal silicon islands170A and 170B in which the source, drains and channel regions (notshown) of exemplary field effect transistors (FETs) 175A and 175B areformed. The combination of substrate 125 and BOX level 130 is also knownas a silicon-on-insulator (SOI) substrate. The invention is applicableto integrated circuit chips fabricated on bulk silicon substrates, inwhich case BOX level 130 will not be present and the source, drains andchannel regions (not shown) of FETs 175A and 175B would be formed insubstrate 125.

Formed through BOX layer 130 from a top surface to a bottom surface ofBOX layer 130 are polysilicon contacts 180A and 180B. Contacts 180A and180B are in electrical contact with diffused substrate contact regions185A and 185B of substrate 125 respectively. If substrate 125 is doped Ntype, then diffused substrate contact regions 185A and 185B are doped Ntype and polysilicon contacts 180A and 180B may also be doped N type. Ifsubstrate 125 is doped P type, then diffused substrate contact regions185A and 185B are doped P type and polysilicon contacts 180A and 180Bmay also be doped P type.

Formed on top of silicon islands 170A and 170B are polysilicon gates190A and 190B respectively. The gate dielectric between gate 190A andsilicon island 170A and between gate 190B and silicon island 170B is notshown in FIG. 2.

Contact level 135 comprises a dielectric layer 195 and contacts 200. Inone example, dielectric layer is boron-phosphorus-silicate glass (BPSG)and contacts 200 comprise tungsten. Contacts 200 extend from a topsurface of dielectric layer through the dielectric layer to electricallycontact source or drains in silicon islands 170A or 170B, gates 190A or190B or contacts 180A or 180B. In one example, contact level 135 may beconsidered a wiring level, particularly when contacts 200 interconnectsource, drains, gates and other structures of two or more FETs.

First wiring level 140 comprises a dielectric layer 205 and damascenewires or vias 210. Second wiring level 145 comprises a dielectric layer215 and dual-damascene or damascene wires 220. Third wiring level 150comprises a dielectric layer 225 and dual-damascene or damascene wires230. Fourth wiring level 155 comprises a dielectric layer 235 anddual-damascene or damascene wires 240. Fifth wiring level 160 comprisesa dielectric layer 245 and dual-damascene or damascene wires 250.

In one example, one or more of dielectric layers 205, 215, 225, 235 and245 each independently comprise one or more layers of silicon nitride(Si₃N₄), silicon carbide (SiC), silicon oxy nitride (SiON), silicon oxycarbide (SiOC), hydrogen doped silica glass (SiCOH), plasma-enhancedsilicon nitride (PSiN_(x)) or NBLok (SiC(N,H)).

In one example, one or more of dielectric layers 205, 215, 225, 235 and245 each independently comprise a low K (dielectric constant) material,examples of which include but are not limited to hydrogen silsesquioxanepolymer (HSQ), methyl silsesquioxane polymer (MSQ), SiLK™ (polyphenyleneoligomer) manufactured by Dow Chemical, Midland, Mich., Black Diamond™(SiO_(x)(CH3)_(y)) manufactured by Applied Materials, Santa Clara,Calif. A low K dielectric material has a relative permittivity of 4 orless.

In one example, wires and vias in wiring levels 140, 145, 150, 155 and160 are formed from a conductive liner filled with a conductive core. Inone example, the conductive liner comprises Ti, Ta, TiN, TaN orcombinations thereof and the core conductor comprises Cu.

Charge dissipation structure 110 comprises a stack of diffused substratecontact region 185A, contact 180A, a contact 200A, a damascene wire210A, a dual-damascene wire 220A, a dual-damascene wire 230A,dual-damascene wire 240A and dual-damascene wire 250A aligned verticallyover one another. Electrical continuity is maintained fromdual-damascene wire 250A through dual-damascene wire 240A,dual-damascene wire 230A, a dual-damascene wire 220A, damascene wire210A, contact 200A, contact 180A to diffused substrate contact region185A of substrate 125 as contact level 135 and each wiring level 140,145, 150, 155 and 160 is fabricated. Charge dissipation structure 110 isnot electrically connected to any other contact in contact level 135 orother wire in wiring levels 140, 145, 150, 155 or 160.

Guard ring 105 comprises a stack of diffused substrate contact region185B, contact 180B, a contact 200B, a damascene wire 210B, adual-damascene wire 220B, a dual-damascene wire 230B, a dual-damascenewire 240B and a dual-damascene wire 250B aligned vertically over oneanother. Electrical continuity is maintained from dual-damascene wire250B through dual-damascene wire 240B, dual-damascene wire 230B,dual-damascene wire 220B, damascene wire 210D, contact 200B, contact180B to diffused substrate contact region 185B of substrate 125 ascontact level 135 and each wiring level 140, 145, 150, 155 and 160 isfabricated. However, contact 200B, damascene wire 210B, dual-damascenewire 220B, dual-damascene wire 230B, dual-damascene wire 240B anddual-damascene wire 250B extend laterally (in and out of the plane ofthe drawing) to form a continuous wall from a top surface 255 of wiringlevel 160 to a top surface 260 of BOX level 130 or to a top surface ofsubstrate without breaks. Guard ring 105 is not electrically connectedto any other contact in contact level 135 or other wire in wiring levels140, 145, 150, 155 or 160.

After fabrication of wiring level 160, terminal pads may be formedelectrically contacting one or more wires 250 as is known in the art.Alternatively, one or more of wires 250 may themselves be terminal pads.

FIG. 3 is a cross-sectional view through an integrated circuit prior toformation of terminals according a variation of the first embodiment ofthe present invention. In FIG. 3, an integrated circuit chip 265 issimilar to integrated circuit chip 100 of FIG. 2, except for a chargedissipation structure 110C which comprises a stack of diffused substratecontact region 185A, contact 180A, contact 200A, damascene wire 210A, adual-damascene wire 220C, a dual-damascene wire 230C, dual-damascenewire 240C and dual-damascene wire 250C which are not vertically alignedover each other as in charge dissipation structure 110 of FIG. 2, butrather form a meandering or zigzag path from top surface 255 tosubstrate 125.

FIG. 4 is a top view of an integrated circuit chip prior to formation ofterminals according a second embodiment of the present invention. InFIG. 4, an integrated circuit 270 includes guard ring 105 and internalguard rings 275A and 275B. Internal guard rings 275A and 275B aresimilar to guard ring 105 except internal guard rings 275A and 275B arenested within guard ring 105. There is an integrated circuit region 280between guard ring 275A (and 275B) and guard ring 105. There are alsointegrated circuit regions 285A and 285B within guard rings 275A and275B respectively. Guard rings 275A and 275B offer additional ESDprotection to integrated circuit regions 285A and 285B respectively,during and after fabrication of integrated circuit 270 and provideisolated regions of integrated circuit 270.

In one example, internal guard rings 275A and 275B form an unbroken,continuous and electrically conductive wall around wires, FETs and otherstructures within internal guard rings 275A and 275B. In one example, alimited number of openings may be made in guard rings 275A and 275B atone or more wiring levels to allow power and signal wires to connectcircuit elements in regions 275A and 275B to circuit elements in region280. However, the less opening and penetrations, the more effectiveguard rings 275A and 275B will be in providing ESD protection and/orisolation.

FIG. 5 is a cross-sectional view through line 5-5 of FIG. 4. In FIG. 5,integrated circuit region 285A is surrounded by internal guard ring275A. Integrated circuit region 285A includes FET 175A and wires 210,220, 230, 240 and 250. A portion of integrated circuit region 280 isshown between inner guard ring 275A and guard ring 105. Integratedcircuit region 280 includes FET 175B and associated wires in wiringlevels 145, 150, 155 and 160.

In FIGS. 4 and 5, guard rings 275A and 275B are not electricallyconnected to guard ring 105 except both contact regions of substrate125, that may or may not be electrically connected. Optionally, one orboth of guard rings 275A and 275B may be electrically connected to guardring 105 by one or more wires formed in wiring levels 145, 150, 155 and160.

FIG. 6 is a top view of an integrated circuit chip prior to formation ofterminals according a third embodiment of the present invention. Thethird embodiment of the present invention is a combination of the firstand second embodiments of the present invention. In FIG. 6, anintegrated circuit chip 290 includes guard ring 105, charge dissipationstructures 110 distributed throughout a region 280 of integrated circuitchip 290, and internal guard ring 275A surrounding region 285A ofintegrated circuit chip 290.

FIG. 7 is a top view of an integrated circuit chip prior to formation ofterminals according a fourth embodiment of the present invention. Thefourth embodiment of the present invention is a combination of the firstand second embodiments of the present invention. In FIG. 7, anintegrated circuit chip 295 includes guard ring 105, charge dissipationstructures 110 distributed throughout a region 280 of integrated circuitchip 295, and internal guard ring 275A surrounding region 285A ofintegrated circuit chip 290. Within internal guard ring 275A are chargedissipation structures 110D, which are similar to charge dissipationstructures 110.

FIG. 8 is a top view illustrating incorporation of dummy fill shapesinto the embodiments of the present invention. In FIG. 8, an integratedcircuit wiring level 300 includes damascene wires 305, 310 and 320 anddual-damascene wires 325 and 330. Dual-damascene wires 325 and 330include integral vias 335 and 340 respectively. Wiring level 330 alsoincludes a multiplicity of damascene fill shapes 345. Fills shapes aredefined supra. Wiring level 330 is exemplary of wiring levels 145, 150,155 and 160 of FIGS. 2, 3 and 5 (also contact level 135 and wiring level140 if adjustments is made for the fact that contact level 135 andwiring level 140 are a single-damascene level) when they include fillshapes. (There is no requirement that a level include fill shapes.)

By addition of an integral via 350 to fill shapes 355, fill shapes 355can be used as part of the wiring stacks making up charge dissipationstructures 110 of FIG. 2, or charge dissipation structures 110C of FIG.3.

An integrated circuit design includes a hierarchal set of mask designlevels from a lowermost level to an uppermost level. The lower levelsdefine features formed in or on the substrate and upper levels definefeatures in wiring levels.

FIG. 9 is a flowchart of a first method of designing an integratedcircuit chip according to the embodiments of the present invention. Instep 400, the first/next mask design level of an integrated circuit chipis selected. It should be understood for dual-damascene wiring levels,two mask levels must be designed, a trench (wire) level and a viaopening (via) level, while contact levels, being single-damascenelevels, only require a single mask level be designed. In step 405contact, wiring or via shapes are placed (e.g. X-Y coordinates on a gridof the integrated circuit chip are assigned to the design shapesrepresenting actual contacts wires and vias that will be fabricated fromphotomasks built from this design process). In step 410, the chargedissipation shapes (or internal guard ring) shapes needed in the currentmask design level are placed. In step 415, optional fill shapes, ifrequired, are placed into the current mask design level. If no fillshapes are to be placed, the method would skip to step 420. In step 420,it is determined if there is another mask level to design. If there isanother mask level to design the method loops back to step 400,otherwise the method is complete.

After mask design is complete, the individual masks needed to fabricatean integrated circuit according to the present invention may befabricated.

FIG. 10 is a flowchart of a second method of designing an integratedcircuit chip according to the embodiments of the present invention. Thesecond method includes using fill shapes in one or more mask levels toform sections of the charge dissipation or internal guard ringstructures.

In step 425, the first/next mask design level of an integrated circuitchip is selected. In step 430 contact, wiring or via shapes are placed.In step 435, optional fill shapes, if required, are placed into thecurrent mask design level. If no fill shapes are to be placed the methodproceeds to step 445 otherwise the method proceeds to step 440. In step440, it is determined if previously placed fill shapes are to be used aspart of a charge dissipation structure. If previously placed fill shapesare to be used as part of a charge dissipation structure, then themethod proceeds to step 450 otherwise the method proceeds to step 445.In step 450, the fill shapes to be used as part of a charge dissipationstructure are selected, and if necessary, their positions adjusted so asto align with other parts of the charge dissipation structure in othermask levels. Then in step, 455, vias are placed in the via mask designcorresponding to the current wire mask design and the method proceeds tostep 445. In step 445, it is determined if charge dissipation shapes areto be added to the current mask level. If charge dissipation shapes arenot to be added, then the method proceeds to step 460, otherwise themethod proceeds to step 465. In step 465, the charge dissipation shapes(or internal guard ring) shapes needed in the current mask design levelare placed and the method proceeds to step 460. In step 460, if there isanother mask level to design the method loops back to step 425,otherwise the method is complete.

Note that adding charge dissipation shapes and employing fill shapes tobe used as sections of charge dissipation structures may both be used inthe same mask level.

After mask design is complete, the individual masks needed to fabricatean integrated circuit according to the present invention may befabricated. Further, it should be understood, that the steps illustratedin FIGS. 9 and 10 describe only those mask levels required for formingcharge dissipation or internal guard rings according to the variousembodiments of the present invention and other mask levels are requiredto be designed to complete a full mask set for manufacturing anintegrated circuit chip.

Thus, the embodiments and variations of the embodiments of the presentinvention provide for a method and structure for charge dissipationduring fabrication of integrated circuits and isolation of circuits andstructures in completed integrated circuits.

The description of the embodiments of the present invention is givenabove for the understanding of the present invention. It will beunderstood that the invention is not limited to the particularembodiments described herein, but is capable of various modifications,rearrangements and substitutions as will now become apparent to thoseskilled in the art without departing from the scope of the invention.Therefore, it is intended that the following claims cover all suchmodifications and changes as fall within the true spirit and scope ofthe invention.

1. A method of fabricating an integrated circuit chip, comprising:forming an electrically conductive substrate contact in a substrate,said substrate contact comprising a doped semiconductor region of saidsubstrate, said substrate contact in electrical contact with saidsubstrate; forming one or more wiring levels over said substrate;forming one or more electrically conductive charge dissipationstructures extending from a top surface of an uppermost wiring level ofsaid one or more wiring levels through each lower wiring level of saidone or more wiring levels to and in electrical contact with saidsubstrate contact; and forming circuit structures in said substrate andin said one or more wiring levels, said charge dissipation structuresnot electrically contacting or connected to any said circuit structuresin any of said one or more wiring levels, said one or more chargedissipation structures dispersed between said circuit structures.
 2. Themethod of claim 1, further including: forming a peripheral substratecontact in said substrate; and forming an electrically conductiveperipheral guard ring extending from a top surface of an uppermostwiring level of said one or more wiring levels through each wiring levelof said one or more wiring levels to and in electrical contact with saidperipheral substrate contact, said peripheral guard ring extending alongand located adjacent to but not abutting a periphery of said integratedcircuit chip in each wiring level of said one or more wiring levels,said peripheral guard ring not electrically contacting any said circuitstructures in any of said one or more wiring levels.
 3. The method ofclaim 2, wherein said peripheral substrate contact extends along and islocated adjacent to but not abutting a periphery of said integratedcircuit chip.
 4. The method of claim 2, further including: forming aninternal substrate contact in said substrate; forming an electricallyconductive internal guard ring extending from a top surface of anuppermost wiring level of said one or more wiring levels through eachwiring level of said one or more wiring levels to and in electricalcontact with said internal substrate contact, said internal guard ringlocated within said peripheral guard ring within each wiring level ofsaid one or more wiring levels, said internal guard ring notelectrically contacting any said circuit structures in any of said oneor more wiring levels; and forming additional circuit structures in saidsubstrate and in said one or more wiring layers, located within saidinternal guard ring.
 5. The method of claim 4, wherein said internalsubstrate contact extends in a ring in said substrate under a lowermostwiring level of said one or more wiring levels.
 6. The method of claim4, further including: forming additional conductive charge dissipationstructures extending from a top surface of an uppermost wiring level ofsaid one or more wiring levels through each lower wiring level of saidone or more wiring levels to and in electrical contact with saidsubstrate contact within said internal guard ring.
 7. The method ofclaim 1, wherein said substrate is a silicon-on-insulator substrate or abulk silicon substrate.
 8. A method, comprising: placing integratedcircuit element shapes comprising substrate contact, contact,single-damascene wire, dual-damascene wire or via shapes in a hierarchalset of design levels from a lowest to a highest design level of anintegrated circuit chip; placing charge dissipation structure shapescomprising additional substrate contact, additional contact, additionalwire or additional via shapes in each design level of said hierarchalset of design levels, within each design level said charge dissipationstructure shapes not contacting said integrated circuit element shapes,said charge dissipation shapes in each design level electricallyconnected to one another and not electrically connected to any contact,via or single-damascene wire shape of said integrated circuit elementshapes in immediately lower design levels of said hierarchal set ofdesign levels; and within one or more of said design levels of saidhierarchal set of design levels, placing fill-shapes, said fill shapesnot contacting each other, said integrated circuit element shapes orsaid charge dissipation structure shapes of a same design level of saidhierarchal set of design levels.
 9. The method of claim 8, furtherincluding: in one or more design levels of said hierarchal set of designlevels, selecting one or more previously placed fill shapes anddesignating the selected fill shapes as said charge dissipationstructure shapes or as additional charge dissipation structure shapes.10. The method of claim 8, further including: placing peripheral guardring structure shapes adjacent to but not abutting a periphery of saidintegrated circuit chip, said peripheral guard ring structure shapescomprising substrate contact, contact, single damascene wire,dual-damascene wire or via shapes in each of said one or more designlevels of said integrated circuit chip design, within each design levelsaid peripheral guard ring structure shapes not contacting saidintegrated circuit element shapes, said peripheral guard ring structureshapes in each design level aligned over one another and not alignedover any charge dissipation structure shapes or any integrated circuitelement shapes in an immediately lower design level of said hierarchalset of design levels.
 11. The method of claim 10, further including:placing internal guard ring structure shapes within said peripheralguard ring shapes, said internal guard ring structure shapes comprisingsubstrate contact, contact, single damascene wire, dual-damascene wireor via shapes in each of said one or more design levels of saidintegrated circuit chip design, within each design level said internalguard ring structure shapes not contacting said integrated circuitelement shapes, said peripheral guard ring structure shapes in eachdesign level aligned over one another and not aligned over any chargedissipation structure shapes or any integrated circuit element shapes inan immediately lower design level of said hierarchal set of designlevels, said internal guard ring structures surrounding one or more ofsaid integrated circuit element shapes of a same design level of saidone or more design levels.
 12. The method of claim 1: wherein saidsubstrate comprises upper and lower silicon layers separated andelectrically isolated by a buried silicon oxide layer, said substratecontact formed in said lower silicon layer; and further includingforming a polysilicon contact through said buried oxide layer, saidpolysilicon contact physically and electrically contacting saidsubstrate contact.
 13. The method of claim 1, wherein said substratecomprises a buried oxide layer between a silicon layer and a basesubstrate, said substrate contact is formed in said base substrate and alowermost wiring level of said one or more wiring levels electricallycontacts a metal contact formed through a region of insulation formed insaid silicon layer and through said buried oxide layer to said substratecontact, said contact electrically isolated from said silicon layer bysaid region of insulation.
 14. The method of claim 8, wherein saidsubstrate contact defines a diffused region in substrate design level ofsaid hierarchal set of design levels.
 15. The method of claim 8,wherein, for a selected design level of said hierarchal set of designlevels, said circuit element shapes are first placed, said chargedissipation structure shapes are placed after placing said circuitelement shapes and said fill shapes are placed after placing said chargedissipation structure shapes.
 16. The method of claim 15, furtherincluding: for said selected design level, selecting fill shapes to useas charge dissipation structure shapes; and placing fill shape viascorresponding to said selected fill shapes into an immediately higher orlower deign level of said hierarchal set of design levels to saidselected design level.
 17. The method of claim 16, further including:determining if additional charge dissipation structure shapes are to beadded to said selected design level and if so, adding said additionalcharge dissipation structure shapes to said at selected design level.18. The method of claim 15, further including: for said selected designlevel, selecting fill shapes to use as charge dissipation structureshapes; moving said selected fill shapes within said selected designlevel; and placing fill shape vias corresponding to said selected fillshapes into an immediately higher or lower deign level of saidhierarchal set of design levels to said selected design level.
 19. Themethod of claim 18, further including: determining if additional chargedissipation structure shapes are to be added to said selected designlevel and if so, adding said additional charge dissipation structureshapes to said at selected design level.